{"id":61904,"date":"2024-07-09T21:12:08","date_gmt":"2024-07-09T21:12:08","guid":{"rendered":"https:\/\/kamucalisani.net\/?p=61904"},"modified":"2024-07-09T21:12:08","modified_gmt":"2024-07-09T21:12:08","slug":"gelecek-sekilleniyor-asml-yeni-nesil-hyper-na-litografi-planlarini-acikladi-2","status":"publish","type":"post","link":"https:\/\/kamucalisani.net\/index.php\/2024\/07\/09\/gelecek-sekilleniyor-asml-yeni-nesil-hyper-na-litografi-planlarini-acikladi-2\/","title":{"rendered":"Gelecek \u015fekilleniyor: ASML, yeni nesil “Hyper-NA” litografi planlar\u0131n\u0131 a\u00e7\u0131klad\u0131"},"content":{"rendered":"

\n

<\/span> <\/figure>\n<\/p>\n

Hollandal\u0131 ASML<\/strong>, g\u00fcn\u00fcm\u00fcz d\u00fcnyas\u0131n\u0131n a\u00e7\u0131k\u00e7as\u0131 en \u00f6nemli teknoloji \u015firketi. Firma, en geli\u015fi\u015f \u00e7iplerin \u00fcretilmesini sa\u011flayan a\u015f\u0131r\u0131 ultraviyole<\/strong> (EUV) litografi sistemlerinin d\u00fcnyadaki tek tedarik\u00e7isi konumunda. Ve \u015fimdi ASML, gelece\u011fe dair yol haritas\u0131n\u0131 a\u00e7\u0131klad\u0131. Firma, gelece\u011fini Hyper-NA<\/strong> litografisi \u00fczerinde in\u015fa edece\u011fini duyurdu. \u0130\u015fte ASML Hyper-NA hakk\u0131ndaki detaylar:<\/p>\n

ASML Hyper-NA ile geliyor<\/b><\/p>\n

ASML’nin eski ba\u015fkan\u0131 Martin van den Brink<\/strong>, k\u0131sa s\u00fcre \u00f6nce yapt\u0131\u011f\u0131 bir sunumda, \u015firketin hen\u00fcz kullan\u0131lmaya ba\u015flanan High-NA EUV sistemlerinin yerini alacak<\/strong> yeni bir “Hyper-NA” EUV teknolojisi \u00fczerinde \u00e7al\u0131\u015ft\u0131\u011f\u0131n\u0131 a\u00e7\u0131klad\u0131. Hyper-NA i\u00e7in s\u00fcre\u00e7 \u015fimdilik ilk a\u015famalarda bulunuyor olsa bu, ilki Intel\u2019in ABD\u2019deki tesisinde<\/strong> kurulan tanesi 400 milyon dolar olan High-NA sistemlerini takip edecek olan litografi teknolojisi olacak.<\/p>\n

<\/span> <\/figure>\n<\/p>\n

High-NA<\/strong> ile birlikte bilindi\u011fi \u00fczere say\u0131sal a\u00e7\u0131kl\u0131k<\/strong> (NA) \u00f6nceki EUV ara\u00e7lar\u0131ndaki 0,33\u2019ten 0,55<\/strong> seviyesine<\/strong> \u00e7\u0131kart\u0131lm\u0131\u015ft\u0131. Bu da 2 nanometre (nm) veya alt\u0131ndaki<\/strong> i\u015flem d\u00fc\u011f\u00fcmlerinin geli\u015ftirilmesi i\u00e7in gerekli olan desen \u00e7izimine olanak sa\u011fl\u0131yor. Bundan neredeyse \u00fc\u00e7 y\u0131l \u00f6nce ASML, High-NA’n\u0131n yonga \u00fcreticilerinin en az 10 y\u0131l boyunca 2 nm’nin \u00e7ok \u00f6tesindeki i\u015flem d\u00fc\u011f\u00fcmlerine ula\u015fmas\u0131na yard\u0131mc\u0131 olaca\u011f\u0131n\u0131 s\u00f6ylemi\u015fti. \u015eimdi ise ASML, 2030 civar\u0131nda 0,75 NA’ya ula\u015fan Hyper-NA<\/strong> litografi makinelerini sunmaya haz\u0131rlan\u0131yor. Elbette bu, Martin van den Brink\u2019in sunumuna dayan\u0131yor. ASML ise yapt\u0131\u011f\u0131 a\u00e7\u0131klamada tarih vermese de Hyper-NA ile ilgili \u00e7al\u0131\u015fmalar\u0131n s\u00fcrd\u00fc\u011f\u00fcn\u00fc s\u00f6yledi.<\/p>\n

I\u015f\u0131k polarizasyonu bir sorun olacak<\/b><\/p>\n

Say\u0131sal a\u00e7\u0131kl\u0131\u011f\u0131nda 0,55\u2019ten 0,75’e \u00e7\u0131kmas\u0131 \u00f6ng\u00f6r\u00fclen s\u0131n\u0131rlar\u0131n\u0131n \u00f6tesinde transist\u00f6r yo\u011funluklar\u0131na sahip \u00e7iplere olanak tan\u0131yacak. Say\u0131sal a\u00e7\u0131kl\u0131\u011f\u0131n artmas\u0131yla birlikte karma\u015f\u0131k ve maliyetli \u00e7oklu desenleme tekniklerine olan ba\u011f\u0131ml\u0131l\u0131k da azalacak<\/strong>. Ancak Hyper-NA i\u00e7in a\u015f\u0131lmas\u0131 gereken baz\u0131 engeller de var. Say\u0131sal a\u00e7\u0131kl\u0131k 0.55 seviyesine ula\u015ft\u0131\u011f\u0131nda istenmeyen bir \u0131\u015f\u0131k polarizasyonu<\/strong> ba\u015fl\u0131yor. I\u015f\u0131k polarizasyonu, g\u00f6r\u00fcnt\u00fcleme kontrast\u0131n\u0131 bozarak \u0131\u015f\u0131k verimini azalt\u0131yor.<\/p>\n

<\/span> <\/figure>\n<\/p>\n

ASML bundan ka\u00e7\u0131nmak i\u00e7in muhtemelen polariz\u00f6rler<\/strong> kullanacak. Ancak bunlar\u0131 eklemek \u0131\u015f\u0131\u011f\u0131n bloke edilmesine, g\u00fc\u00e7 verimlili\u011fin azalmas\u0131na ve haliyle \u00fcretim maliyetlerinin y\u00fckselmesine sebep olacak. Bu sorun \u00e7\u00f6z\u00fclmek zorunda.<\/p>\n

Hyper-NA’in bir di\u011fer zorlu\u011fu da diren\u00e7<\/strong> olacak. Bu da \u00e7\u00f6z\u00fcn\u00fcrl\u00fc\u011f\u00fcn korunmas\u0131n\u0131 zorla\u015ft\u0131racak ve muhtemelen diren\u00e7 malzemelerinin daha da incelmesini gerektirecek. Sorunlar elbette ASML m\u00fchendisli\u011finin \u00e7\u00f6zemeyece\u011fi bir seviyede de\u011fil. Dolay\u0131s\u0131yla Hyper-NA, High-NA’in fiziksel s\u0131n\u0131rlar\u0131na ula\u015f\u0131lmas\u0131yla birlikte bu on y\u0131l\u0131n sonlar\u0131na do\u011fru<\/strong> muhtemelen sekt\u00f6r genelinde yayg\u0131nla\u015fmaya ba\u015flayacak.<\/p>\n

High-NA daha yolun ba\u015f\u0131nda<\/b><\/p>\n

Sekt\u00f6r\u00fcn ilk High-NA litografi sistemini \u00e7oklu desenlemedeki zorluklar nedeniyle 0,33 NA EUV ara\u00e7lar\u0131n\u0131 benimsemeyen, bu s\u00fcrede TSMC\u2019ye yar\u0131 iletken \u00fcretimi liderli\u011fini teslim eden Intel taraf\u0131ndan kuruldu. Intel<\/strong>, High-NA ile \u00f6n\u00fcm\u00fczdeki birka\u00e7 y\u0131l i\u00e7inde s\u00fcre\u00e7 liderli\u011fini TSMC\u2019den almay\u0131 hedefliyor. Intel, \u00e7oklu desenleme ile maliyet y\u00fck\u00fcn\u00fc istemedi a\u00e7\u0131k\u00e7as\u0131. Bunu en basit haliyle \u015f\u00f6yle d\u00fc\u015f\u00fcnebilirsiniz: Elinizdeki iki tane \u00e7ok k\u00fc\u00e7\u00fck maske bulunuyor. Bunlar\u0131 \u00fcst \u00fcste hi\u00e7bir hata pay\u0131 olmadan koyman\u0131z gerekiyor. Intel, bu zorluk yerine High-NA\u2019i bekledi. Intel, \u00e7ift desenleme konusunda TSMC kadar uzmanla\u015fmam\u0131\u015ft\u0131.<\/p>\n

TSMC<\/strong>, en az\u0131ndan \u015fimdilik High-NA ara\u00e7lar\u0131 kurmay\u0131 planlam\u0131yor<\/strong>. Samsung<\/strong>, Micron<\/strong> ve SK<\/strong> Hynix<\/strong> gibi yonga \u00fcreticileri de High-NA i\u00e7in kuyrukta bekliyor.<\/p>\n

High-NA sayesinde, 2 nm’den 14 angstrom’a, 10 angstrom (1nm) ve hatta belki de 7 angstrom’a <\/strong>kadar uzanan s\u00fcre\u00e7 teknolojilerini g\u00f6rece\u011fiz. Bundan sonras\u0131nda ise Hyper-NA devreye girecek.<\/p>\n

High-NA ve Hyper-NA\u2019den sonra<\/b><\/p>\n

<\/span> Hyper-NA’n\u0131n \u00f6tesinde, desenleri do\u011frudan bir silikon yonga plakas\u0131na yazarak pahal\u0131 fotomask kullan\u0131m\u0131n\u0131 ortadan kald\u0131ran \u00e7ok \u0131\u015f\u0131nl\u0131 elektron \u0131\u015f\u0131n\u0131 litografisi<\/strong> fikri bulunuyor. E-\u0131\u015f\u0131n litografi ara\u00e7lar\u0131n\u0131 geli\u015ftiren tek \u015firket olan Hollanda merkezli Mapper\u2019in iflas<\/strong> etmi\u015f olmas\u0131<\/strong> ise bu teknik i\u00e7in iyiye i\u015faret de\u011fil. <\/figure>\n

Litografi d\u0131\u015f\u0131nda, ara\u015ft\u0131rmac\u0131lar \u00f6l\u00e7eklendirmeyi s\u00fcrd\u00fcrmek i\u00e7in transist\u00f6rlerin boyutunu k\u00fc\u00e7\u00fcltmeye \u00e7al\u0131\u015f\u0131yorlar ancak bunun da bir s\u0131n\u0131r\u0131 var. 2 angstromluk cihazlar \u00fcretmek demek ortada iki atom var demek. Bu, bir noktada geli\u015fimin imkans\u0131z veya \u00e7ok maliyetli hale gelece\u011fi anlam\u0131na geliyor. Dolay\u0131s\u0131yla gelecekte silikonun yerine ge\u00e7ecek malzemeler<\/strong> olacak. Silikonun yerini alacak (bkz: grafen) ve elektronlara daha y\u00fcksek hareket yetenekleri sa\u011flayabilecek malzemeler bulunuyor.<\/p>\n

Ara\u015ft\u0131rmac\u0131lar bir gecede silikonun yerini alacak bir malzeme de aram\u0131yor asl\u0131nda. Muhtemelen \u00f6n\u00fcm\u00fczdeki birka\u00e7 on y\u0131lda silikon temelli ancak grafen veya ba\u015fka bir malzeme tabakas\u0131n\u0131 da i\u00e7eren \u00e7ipler g\u00f6rece\u011fiz.<\/p>\n\n

Kaynak\u00a0 :\u00a0https:\/\/www.donanimhaber.com\/asml-yeni-nesil-hyper-na-litografi-planlarini-acikladi–178439<\/span><\/p>\n","protected":false},"excerpt":{"rendered":"

Hollandal\u0131 ASML, g\u00fcn\u00fcm\u00fcz d\u00fcnyas\u0131n\u0131n a\u00e7\u0131k\u00e7as\u0131 en \u00f6nemli teknoloji \u015firketi. Firma, en geli\u015fi\u015f \u00e7iplerin \u00fcretilmesini sa\u011flayan a\u015f\u0131r\u0131 ultraviyole (EUV) litografi sistemlerinin d\u00fcnyadaki tek tedarik\u00e7isi konumunda. Ve \u015fimdi ASML, gelece\u011fe dair yol …<\/p>\n","protected":false},"author":1,"featured_media":61905,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[8],"tags":[2167,2168,1471,1233,506],"class_list":["post-61904","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-teknoloji","tag-asml","tag-desen","tag-euv","tag-intel","tag-tek"],"_links":{"self":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/61904","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/comments?post=61904"}],"version-history":[{"count":1,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/61904\/revisions"}],"predecessor-version":[{"id":61910,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/61904\/revisions\/61910"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/media\/61905"}],"wp:attachment":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/media?parent=61904"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/categories?post=61904"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/tags?post=61904"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}