{"id":81874,"date":"2024-08-16T21:00:07","date_gmt":"2024-08-16T21:00:07","guid":{"rendered":"https:\/\/kamucalisani.net\/?p=81874"},"modified":"2024-08-16T21:00:07","modified_gmt":"2024-08-16T21:00:07","slug":"samsung-asmlnin-high-na-euv-cihazini-bu-sene-sonunda-kuracak","status":"publish","type":"post","link":"https:\/\/kamucalisani.net\/index.php\/2024\/08\/16\/samsung-asmlnin-high-na-euv-cihazini-bu-sene-sonunda-kuracak\/","title":{"rendered":"Samsung, ASML’nin High-NA EUV cihaz\u0131n\u0131 bu sene sonunda kuracak"},"content":{"rendered":"

<\/span> G\u00fcney Koreli Seoul Economic Daily sitesinin haberine g\u00f6re Samsung, ASML<\/strong>‘nin en geli\u015fmi\u015f High-NA EUV<\/strong> litografi makinesini bu y\u0131l\u0131n son \u00e7eyre\u011fi ile 2025’in ilk \u00e7eyre\u011fi<\/strong> aras\u0131nda kurmay\u0131 planl\u0131yor.\u00a0 <\/figure>\n

Samsung, yeni arac\u0131 \u00f6ncelikli olarak ara\u015ft\u0131rma ve geli\u015ftirme<\/strong> ama\u00e7lar\u0131 i\u00e7in kullanacak. \u015eirket ayr\u0131ca,\u00a0 Lasertec, JSR, Tokyo Electron ve Synopsys ile bir High-NA ekosistemi \u00fczerinde \u00e7al\u0131\u015f\u0131yor.<\/p>\n

Samsung’un ilk ASML Twinscan EXE:5000 High-NA litografi sistemi, \u015firketin mant\u0131k ve DRAM \u00fcretimi i\u00e7in yeni nesil \u00fcretim teknolojilerini geli\u015ftirece\u011fi Hwaseong kamp\u00fcs\u00fcne kurulacak.<\/strong> \u00dcnitenin 2025 ortalar\u0131nda faaliyete ge\u00e7mesi \u00f6ng\u00f6r\u00fcl\u00fcyor. <\/strong>Sonu\u00e7 olarak Samsung, ilk High-NA EUV arac\u0131n\u0131 Intel’den yakla\u015f\u0131k bir y\u0131l sonra faaliyete ge\u00e7irecek, ancak rakipleri TSMC ve SK hynix’in \u00f6n\u00fcnde yer alacak.<\/strong> Samsung’un seri \u00fcretim i\u00e7in High-NA EUV’yi ne zaman benimseyece\u011fi hen\u00fcz belli de\u011fil.<\/p>\n

High-NA EUV ekosistemi kuracak<\/b><\/p>\n

Samsung, High-NA EUV teknolojisi etraf\u0131nda geli\u015fmi\u015f bir ekosistem<\/strong> kurmay\u0131 planl\u0131yor. G\u00fcney Koreli dev, yeni ekipman\u0131 edinmenin yan\u0131 s\u0131ra, \u00f6zellikle High-NA fotomaskeler i\u00e7in denetim ekipman\u0131 geli\u015ftirmek \u00fczere Japon Lasertec \u015firketiyle i\u015f birli\u011fi yap\u0131yor. Bu kapsamda, Samsung’un Lasertec’in High-NA EUV maske denetim arac\u0131 olan Actis A300’\u00fc sat\u0131n ald\u0131\u011f\u0131 bildiriliyor.\u00a0Samsung ayr\u0131ca, 2027 y\u0131l\u0131na kadar High-NA EUV ara\u00e7lar\u0131n\u0131n ticari uygulamas\u0131na haz\u0131rlanmak i\u00e7in fotorezist \u00fcreticisi JSR ve a\u015f\u0131nd\u0131rma makineleri \u00fcreticisi Tokyo Electron ile de i\u015f birli\u011fi yap\u0131yor.\u00a0<\/p>\n

ASML’nin High-NA EUV Twinscan EXE arac\u0131, tek bir pozlamayla maksimum 13 nm<\/strong> \u00e7\u00f6z\u00fcn\u00fcrl\u00fc\u011fe imkan tan\u0131yan mevcut Low-NA EUV<\/strong> sistemlerinden \u00f6nemli \u00f6l\u00e7\u00fcde y\u00fcksek olan 8 nm<\/strong> \u00e7\u00f6z\u00fcn\u00fcrl\u00fc\u011fe ula\u015fabiliyor. Bu geli\u015fmeyle, transist\u00f6rler yakla\u015f\u0131k 1,7 kat daha k\u00fc\u00e7\u00fclerek, transist\u00f6r yo\u011funlu\u011fu neredeyse \u00fc\u00e7 kat\u0131na \u00e7\u0131kacak.<\/strong><\/p>\n

Low-NA sistemleri de bu \u00e7\u00f6z\u00fcn\u00fcrl\u00fck ve yo\u011funluk seviyesine ula\u015fabilse de, maliyetli ve karma\u015f\u0131k \u00e7ift desenleme<\/strong> s\u00fcrecini gerektiriyorlar. High-NA EUV teknolojisine ge\u00e7i\u015f ile \u00e7ift desenleme ihtiyac\u0131 ortadan kalkarak \u00fcretimin basitle\u015fmesi, verimin ve maliyetlerin d\u00fc\u015fmesi bekleniyor.<\/strong><\/p>\n

Bu 8nm kritik boyutlara ula\u015fmak, 3nm alt\u0131 \u00fcretim teknolojilerine sahip yongalar \u00fcretmek i\u00e7in b\u00fcy\u00fck \u00f6nem ta\u015f\u0131yor. Yine de, 2nm s\u0131n\u0131f\u0131 d\u00fc\u011f\u00fcmlerde, hemen hemen t\u00fcm yonga \u00fcreticileri \u00e7ift desenleme kullanacak. Intel ayr\u0131ca 20A d\u00fc\u011f\u00fcm\u00fc i\u00e7in desen \u015fekillendirme ara\u00e7lar\u0131n\u0131 benimsiyor. Intel, High-NA EUV’yi ilk olarak 14A <\/strong>s\u00fcrecinde kullanmay\u0131 planl\u0131yor.<\/p>\n\n

Kaynak\u00a0 :\u00a0https:\/\/www.donanimhaber.com\/samsung-asml-nin-high-na-euv-cihazini-bu-sene-sonunda-kuracak–180764<\/span><\/p>\n","protected":false},"excerpt":{"rendered":"

G\u00fcney Koreli Seoul Economic Daily sitesinin haberine g\u00f6re Samsung, ASML’nin en geli\u015fmi\u015f High-NA EUV litografi makinesini bu y\u0131l\u0131n son \u00e7eyre\u011fi ile 2025’in ilk \u00e7eyre\u011fi aras\u0131nda kurmay\u0131 planl\u0131yor.\u00a0 Samsung, yeni arac\u0131 \u00f6ncelikli olarak ara\u015ft\u0131rma ve …<\/p>\n","protected":false},"author":1,"featured_media":81875,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[8],"tags":[506,479],"class_list":["post-81874","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-teknoloji","tag-tek","tag-uretim"],"_links":{"self":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/81874","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/comments?post=81874"}],"version-history":[{"count":1,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/81874\/revisions"}],"predecessor-version":[{"id":81877,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/81874\/revisions\/81877"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/media\/81875"}],"wp:attachment":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/media?parent=81874"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/categories?post=81874"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/tags?post=81874"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}