{"id":95143,"date":"2024-09-22T23:24:07","date_gmt":"2024-09-22T23:24:07","guid":{"rendered":"https:\/\/kamucalisani.net\/?p=95143"},"modified":"2024-09-22T23:24:07","modified_gmt":"2024-09-22T23:24:07","slug":"abdye-ragmen-cin-cip-uretiminde-ilerliyor-yeni-euv-patenti-alindi","status":"publish","type":"post","link":"https:\/\/kamucalisani.net\/index.php\/2024\/09\/22\/abdye-ragmen-cin-cip-uretiminde-ilerliyor-yeni-euv-patenti-alindi\/","title":{"rendered":"ABD\u2019ye ra\u011fmen \u00c7in, \u00e7ip \u00fcretiminde ilerliyor: Yeni EUV patenti al\u0131nd\u0131"},"content":{"rendered":"

<\/span> \u00c7in<\/strong>, yar\u0131 iletken \u00fcretiminde ya\u015fanan s\u0131k\u0131nt\u0131lara ra\u011fmen \u00f6nemli bir ad\u0131m atarak EUV<\/strong> (a\u015f\u0131r\u0131 ultraviyole) litografi alan\u0131nda yeni bir patentle dikkat \u00e7ekiyor. Shanghai Micro Electronics Equipment<\/strong> (SMEE) taraf\u0131ndan geli\u015ftirilen bu patent, ABD yapt\u0131r\u0131mlar\u0131na ra\u011fmen \u00c7in’in yerli litografi ekipmanlar\u0131nda ilerleme kaydetti\u011fini g\u00f6steriyor. <\/figure>\n

\u00c7in, EUV teknolojisinde ilerliyor<\/b><\/p>\n

2023 y\u0131l\u0131n\u0131n Mart ay\u0131nda ba\u015fvurusu yap\u0131lan \u201ca\u015f\u0131r\u0131 ultraviyole [EUV] radyasyon jenerat\u00f6rleri ve litografi ekipman\u0131\u201d<\/em> patenti, ge\u00e7ti\u011fimiz g\u00fcnlerde halka a\u00e7\u0131kland\u0131. Ancak bu patent h\u00e2l\u00e2 \u00c7in Ulusal Fikri M\u00fclkiyet \u0130daresi taraf\u0131ndan inceleniyor. SMEE’nin geli\u015ftirdi\u011fi bu teknoloji, \u00fclkenin yar\u0131 iletken sekt\u00f6r\u00fcndeki zay\u0131f noktalardan biri olan EUV litografisinde \u00f6nemli bir geli\u015fme olarak de\u011ferlendiriliyor.<\/p>\n

Y\u0131llar s\u00fcren \u00e7abalara ra\u011fmen SMEE<\/strong>, 28 nanometre ve alt\u0131ndaki i\u015flemler i\u00e7in kullan\u0131labilecek litografi donan\u0131m\u0131n\u0131 g\u00fcvenilir bir \u015fekilde seri \u00fcretme konusunda EUV alan\u0131n\u0131n tekeli ASML\u2019nin gerisinde<\/strong> kalm\u0131\u015f durumda. 2019’dan beri ASML\u2019nin bu ekipmanlar\u0131 \u00c7in’e ihra\u00e7 etmesi k\u0131s\u0131tlan\u0131yor.<\/p>\n

<\/span> \u00d6te yandan SMEE, \u00c7in’in geli\u015fmi\u015f litografi ara\u00e7lar\u0131 \u00fcretimindeki en g\u00fc\u00e7l\u00fc yerli oyunculardan biri olarak \u00f6ne \u00e7\u0131k\u0131yor. Ancak, bu \u015firket ABD Ticaret Bakanl\u0131\u011f\u0131 taraf\u0131ndan Aral\u0131k 2022’de kara listeye al\u0131narak ABD teknolojilerini ithal etme konusunda ciddi k\u0131s\u0131tlamalarla kar\u015f\u0131 kar\u015f\u0131ya kalm\u0131\u015ft\u0131. \u00c7in’in litografi makineleri pazar\u0131nda y\u00fczde 99’luk bir paya sahip olan ASML<\/strong>, Nikon<\/strong> ve Canon<\/strong> gibi Japon ve Hollandal\u0131 \u015firketler sekt\u00f6r\u00fc domine ediyor. \u00c7in, bu alanda d\u0131\u015far\u0131ya ciddi oranda ba\u011f\u0131ml\u0131. <\/figure>\n

Yapt\u0131r\u0131mlar \u00c7in’i zorluyor<\/b><\/p>\n

Bu firmalardan sadece Hollandal\u0131 ASML, 7 nanometre alt\u0131ndaki <\/strong>\u00e7ipleri \u00fcretebilecek makineler geli\u015ftirebiliyor. EUV <\/strong>litografisi, 13.5 nanometrelik bir dalga boyu kullanarak, daha eski teknolojilere k\u0131yasla neredeyse 14 kat daha k\u00fc\u00e7\u00fck dalga boyuna sahip olan \u0131\u015f\u0131nlarla \u00e7ip \u00fcretimine olanak tan\u0131yor. Bu ara\u00e7lar sayesinde bug\u00fcn iPhone, Galaxy S24 ve akl\u0131n\u0131za gelebilecek en geli\u015fmi\u015f \u00e7ipler TSMC ve Samsung gibi \u00fcreticiler taraf\u0131ndan \u00fcretilebiliyor.<\/p>\n

<\/span> Hollanda’n\u0131n ihracat k\u0131s\u0131tlamalar\u0131n\u0131 g\u00fcncelledi\u011fi 6 Eyl\u00fcl tarihinden itibaren ASML’nin \u00c7in’deki litografi sistemleri i\u00e7in yedek par\u00e7a ve yaz\u0131l\u0131m g\u00fcncellemeleri sa\u011flamas\u0131 i\u00e7in de lisans almas\u0131 zorunlu k\u0131l\u0131nd\u0131. <\/figure>\n

\u00c7in, yapt\u0131r\u0131mlar gelmeden veya s\u0131k\u0131la\u015fmadan \u00f6nce EUV litografi ara\u00e7lar\u0131 olamasa da daha eski DUV <\/strong>(derin ultraviyole) ekipmanlar\u0131n\u0131 yo\u011fun bir \u015fekilde sat\u0131n ald\u0131. Bu ara\u00e7lar\u0131 kullanan ve ayn\u0131 zamanda ABD’nin de yapt\u0131r\u0131m uygulad\u0131\u011f\u0131 \u00c7in’in en b\u00fcy\u00fck d\u00f6k\u00fcmhanesi Semiconductor International Manufacturing Corporation (SMIC), Huawei’nin ge\u00e7en y\u0131l piyasaya s\u00fcrd\u00fc\u011f\u00fc amiral gemisi Mate 60<\/strong> telefonuna g\u00fc\u00e7 veren 7nm\u2019lik Kirin 9000<\/strong>\u2019leri \u00fcretmi\u015fti. Ancak SMIC, bunu ba\u015farabilmek i\u00e7in \u00e7oklu desenleme y\u00f6ntemini kullanmak zorunda kald\u0131; bu da, \u00fcretim verimini d\u00fc\u015f\u00fcrerek daha az kusursuz \u00fcr\u00fcn elde edilmesine neden oluyor.<\/p>\n\n

Kaynak\u00a0 :\u00a0https:\/\/www.donanimhaber.com\/abd-ye-ragmen-cin-cip-uretiminde-kritik-bir-patent-aldi–181897<\/span><\/p>\n","protected":false},"excerpt":{"rendered":"

\u00c7in, yar\u0131 iletken \u00fcretiminde ya\u015fanan s\u0131k\u0131nt\u0131lara ra\u011fmen \u00f6nemli bir ad\u0131m atarak EUV (a\u015f\u0131r\u0131 ultraviyole) litografi alan\u0131nda yeni bir patentle dikkat \u00e7ekiyor. Shanghai Micro Electronics Equipment (SMEE) taraf\u0131ndan geli\u015ftirilen bu patent, ABD …<\/p>\n","protected":false},"author":1,"featured_media":95144,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[8],"tags":[453,1471],"class_list":["post-95143","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-teknoloji","tag-cin","tag-euv"],"_links":{"self":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/95143","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/comments?post=95143"}],"version-history":[{"count":1,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/95143\/revisions"}],"predecessor-version":[{"id":95148,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/posts\/95143\/revisions\/95148"}],"wp:featuredmedia":[{"embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/media\/95144"}],"wp:attachment":[{"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/media?parent=95143"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/categories?post=95143"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/kamucalisani.net\/index.php\/wp-json\/wp\/v2\/tags?post=95143"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}